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1.3 GHz单cell超导射频腔等离子体清洗放电研究(英文)

杨磊 吴安东 卢亮 李永明 徐显波 陈龙 李晨星 孙列鹏 李春龙 马伟 何涛 邢超超 何源

杨磊, 吴安东, 卢亮, 李永明, 徐显波, 陈龙, 李晨星, 孙列鹏, 李春龙, 马伟, 何涛, 邢超超, 何源. 1.3 GHz单cell超导射频腔等离子体清洗放电研究(英文)[J]. 原子核物理评论, 2018, 35(3): 278-286. doi: 10.11804/NuclPhysRev.35.03.278
引用本文: 杨磊, 吴安东, 卢亮, 李永明, 徐显波, 陈龙, 李晨星, 孙列鹏, 李春龙, 马伟, 何涛, 邢超超, 何源. 1.3 GHz单cell超导射频腔等离子体清洗放电研究(英文)[J]. 原子核物理评论, 2018, 35(3): 278-286. doi: 10.11804/NuclPhysRev.35.03.278
YANG Lei, WU Andong, LU Liang, LI Yongming, XU Xianbo, CHEN Long, LI Chenxing, SUN Liepeng, LI Chunlong, MA Wei, HE Tao, XING Chaochao, HE Yuan. Research on Plasma Discharge for Plasma Processing of a 1.3 GHz Single-cell SRF Cavity[J]. Nuclear Physics Review, 2018, 35(3): 278-286. doi: 10.11804/NuclPhysRev.35.03.278
Citation: YANG Lei, WU Andong, LU Liang, LI Yongming, XU Xianbo, CHEN Long, LI Chenxing, SUN Liepeng, LI Chunlong, MA Wei, HE Tao, XING Chaochao, HE Yuan. Research on Plasma Discharge for Plasma Processing of a 1.3 GHz Single-cell SRF Cavity[J]. Nuclear Physics Review, 2018, 35(3): 278-286. doi: 10.11804/NuclPhysRev.35.03.278

1.3 GHz单cell超导射频腔等离子体清洗放电研究(英文)

doi: 10.11804/NuclPhysRev.35.03.278
基金项目: 国家自然科学基金资助项目(91426303,11475232,11535016)
详细信息
  • 中图分类号: O571.6;P142.9

Research on Plasma Discharge for Plasma Processing of a 1.3 GHz Single-cell SRF Cavity

Funds: National Natural Science Foundation of China(91426303, 11475232, 11535016)
  • 摘要: 场致发射限制超导射频腔加速梯度增长。为了减少超导射频腔场致发射,在室温条件下,设计搭建了1.3GHz单cell超导射频腔等离子体清洗实验装置,开展等离子体清洗放电研究。使用CST软件模拟腔中的电磁场分布并且优化外部品质因数得到合适的放电条件。随着压强、前向功率和含氧量的变化,实验探讨了Ar/Ar-O2放电的物理特征和电子激发温度的变化趋势。残余气体分析结果表明,Ar/O2等离子体清洗能够消除腔体内表面的碳化物。


    Field emission limits the accelerating gradient increase in SRF cavities. In order to reduce field emission of SRF cavities, the plasma processing experimental setup of a 1.3 GHz single-cell SRF cavity is designed and built to carry out plasma processing discharge research at room temperature. The electromagnetic field distribution is simulated and the external quality factor is optimized to provide a suitable discharge condition using CST software. It is explored that the physical property of Ar/Ar-O2 discharge and the variation trend of electron excitation temperature with the changes of pressure, forward power and O2 content in experiment. The result of residual gas analysis indicates that Ar/O2 plasma processing can eliminate the carbide of the inner surface of cavity.
  • [1] PADAMSEE H, KNOBLOC J, HAYS T, et al. RF superconductivity for accelerators. New York:WILY-VCH, 2008.
    [2] SCHWETTMAN A H, TURNEAURE P J, WAITES F R, et al. Journal of Applied Physics, 1974, 45:914.
    [3] TYAGI V P, DOLEANS M, HANNAH B, et al. Appl Surf Sci, 2016, 369:29.
    [4] DOLEANS M, TYAGI V P, AFANADOR R, et al. Nucl Instr Method A, 2016, 812:50.
    [5] CST Simulation Packages, https://www.cst.com/.
    [6] http://www.bbef-tech.com/.
    [7] AHMED S, MAMMOSSER D J. Review of Scientific Instruments, 2015, 86:073303.
    [8] GE M, FURUTA F, HOFFSTAETTER G, et al. Efforts of the Improvement of Cavity Q-Value by Plasma Cleaning Technology:Plan and Results from Cornell Unviversity[C]//Proceeding of SRF2015, 2015.
    [9] LIEBERMAN M A, LICHTENBERG A J. Principle of Plasma Discharges and Materials Processing[M]. Hoboken:John Wiley & Sons, 2005.
    [10] YOUNUS M, REHMAN U N, SHAFIQ M, et al. Physics of Plasmas, 2016, 23:083521.
    [11] CHUNG H T, KANG R H, BAE K M, et al. Physics of Plasmas, 2012, 19:113502.
    [12] GRIEM R H. Principles of Plasma Spectroscopy[M]. Cambridge:Cambridge University Press, 1997.
    [13] https://www.nist.gov/pml/atomic-spectra-database/.
    [14] WU H, ZHAO Y P, CUI H Y, et al. Diagnostics of Electron Temperature and Density in a Capillary Predischarge Ar Plasma[C]//International Academic Symposium on Optoelectronics and Microelectronics Technology, 2011.
    [15] CHEN F F, CHANG J P. Lecture Notes on Principles of Plasma Processing. Los Angeles:Plenum/Kluwer Publishers, 2002.
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出版历程
  • 收稿日期:  2018-06-05
  • 修回日期:  2018-07-22
  • 刊出日期:  2018-09-20

1.3 GHz单cell超导射频腔等离子体清洗放电研究(英文)

doi: 10.11804/NuclPhysRev.35.03.278
    基金项目:  国家自然科学基金资助项目(91426303,11475232,11535016)
  • 中图分类号: O571.6;P142.9

摘要: 场致发射限制超导射频腔加速梯度增长。为了减少超导射频腔场致发射,在室温条件下,设计搭建了1.3GHz单cell超导射频腔等离子体清洗实验装置,开展等离子体清洗放电研究。使用CST软件模拟腔中的电磁场分布并且优化外部品质因数得到合适的放电条件。随着压强、前向功率和含氧量的变化,实验探讨了Ar/Ar-O2放电的物理特征和电子激发温度的变化趋势。残余气体分析结果表明,Ar/O2等离子体清洗能够消除腔体内表面的碳化物。


Field emission limits the accelerating gradient increase in SRF cavities. In order to reduce field emission of SRF cavities, the plasma processing experimental setup of a 1.3 GHz single-cell SRF cavity is designed and built to carry out plasma processing discharge research at room temperature. The electromagnetic field distribution is simulated and the external quality factor is optimized to provide a suitable discharge condition using CST software. It is explored that the physical property of Ar/Ar-O2 discharge and the variation trend of electron excitation temperature with the changes of pressure, forward power and O2 content in experiment. The result of residual gas analysis indicates that Ar/O2 plasma processing can eliminate the carbide of the inner surface of cavity.

English Abstract

杨磊, 吴安东, 卢亮, 李永明, 徐显波, 陈龙, 李晨星, 孙列鹏, 李春龙, 马伟, 何涛, 邢超超, 何源. 1.3 GHz单cell超导射频腔等离子体清洗放电研究(英文)[J]. 原子核物理评论, 2018, 35(3): 278-286. doi: 10.11804/NuclPhysRev.35.03.278
引用本文: 杨磊, 吴安东, 卢亮, 李永明, 徐显波, 陈龙, 李晨星, 孙列鹏, 李春龙, 马伟, 何涛, 邢超超, 何源. 1.3 GHz单cell超导射频腔等离子体清洗放电研究(英文)[J]. 原子核物理评论, 2018, 35(3): 278-286. doi: 10.11804/NuclPhysRev.35.03.278
YANG Lei, WU Andong, LU Liang, LI Yongming, XU Xianbo, CHEN Long, LI Chenxing, SUN Liepeng, LI Chunlong, MA Wei, HE Tao, XING Chaochao, HE Yuan. Research on Plasma Discharge for Plasma Processing of a 1.3 GHz Single-cell SRF Cavity[J]. Nuclear Physics Review, 2018, 35(3): 278-286. doi: 10.11804/NuclPhysRev.35.03.278
Citation: YANG Lei, WU Andong, LU Liang, LI Yongming, XU Xianbo, CHEN Long, LI Chenxing, SUN Liepeng, LI Chunlong, MA Wei, HE Tao, XING Chaochao, HE Yuan. Research on Plasma Discharge for Plasma Processing of a 1.3 GHz Single-cell SRF Cavity[J]. Nuclear Physics Review, 2018, 35(3): 278-286. doi: 10.11804/NuclPhysRev.35.03.278
参考文献 (15)

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