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Volume 12 Issue 2
Jun.  1995
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Hang De-sheng. An Application of 12MeV Electron Irradiation in Semiconductor Devices[J]. Nuclear Physics Review, 1995, 12(2): 67-68. doi: 10.11804/NuclPhysRev.12.02.067
Citation: Hang De-sheng. An Application of 12MeV Electron Irradiation in Semiconductor Devices[J]. Nuclear Physics Review, 1995, 12(2): 67-68. doi: 10.11804/NuclPhysRev.12.02.067

An Application of 12MeV Electron Irradiation in Semiconductor Devices

doi: 10.11804/NuclPhysRev.12.02.067
  • Received Date: 1900-01-01
  • Rev Recd Date: 1900-01-01
  • Publish Date: 1995-06-20
通讯作者: 陈斌, bchen63@163.com
  • 1. 

    沈阳化工大学材料科学与工程学院 沈阳 110142

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An Application of 12MeV Electron Irradiation in Semiconductor Devices

doi: 10.11804/NuclPhysRev.12.02.067

Abstract: This article gives complete introduction to the principles, method and traits of the technology of the high-energy 12MeV electron irradiation. It also describes a successful application in fast diode, switch transistor and fast SCR.

Hang De-sheng. An Application of 12MeV Electron Irradiation in Semiconductor Devices[J]. Nuclear Physics Review, 1995, 12(2): 67-68. doi: 10.11804/NuclPhysRev.12.02.067
Citation: Hang De-sheng. An Application of 12MeV Electron Irradiation in Semiconductor Devices[J]. Nuclear Physics Review, 1995, 12(2): 67-68. doi: 10.11804/NuclPhysRev.12.02.067

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