Development of High dose and High energy Ion Implantation

Zhao Wei-jiang; Wang Yu-gang; Yan Sha; Xue Jian-ming; Kang Yi-xiu; Yu Fu-chun

doi:10.11804/NuclPhysRev.13.02.047

PDF
Cite
Share
facebook

twitter

google

linkedin

Volume 13 Issue 2

Turn off MathJax

Article Contents

Article Navigation > Nuclear Physics Review > 1996 > 13(2): 47-49

Zhao Wei-jiang, Wang Yu-gang, Yan Sha, Xue Jian-ming, Kang Yi-xiu, Yu Fu-chun. Development of High dose and High energy Ion Implantation[J]. Nuclear Physics Review, 1996, 13(2): 47-49. doi: 10.11804/NuclPhysRev.13.02.047

Citation:

Zhao Wei-jiang, Wang Yu-gang, Yan Sha, Xue Jian-ming, Kang Yi-xiu, Yu Fu-chun. Development of High dose and High energy Ion Implantation[J]. Nuclear Physics Review, 1996, 13(2): 47-49. doi: 10.11804/NuclPhysRev.13.02.047

Development of High dose and High energy Ion Implantation

doi: 10.11804/NuclPhysRev.13.02.047

(Institute of Heavy Ion Physics, Peking University, Beijing 100871),

Received Date: 1900-01-01
Rev Recd Date: 1900-01-01
Publish Date: 1996-06-20

Abstract

The development of high dose ion implantation and high energy ion implantation at the Ion Beam Application Group of IHIP in recent years is reviewed.
- ion implantation,
- dynamic targets,
- ion radiation damage,
- surface modification of materials
References
Proportional views

通讯作者: 陈斌, bchen63@163.com

1.
沈阳化工大学材料科学与工程学院沈阳 110142

Get Citation

PDF

XML

Article Metrics

Article views(1855) PDF downloads(551) Cited by()

Proportional views