Applications of Multicomponent Ion Beam Enhanced Deposition in New Film Material

ZHANG Tao; ZHANG Tong-he; ZHANG Hui-xing; MA Ben-kun; LI Guo-qing; GONG Ze-xiang

doi:10.11804/NuclPhysRev.14.03.173

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Article Navigation > Nuclear Physics Review > 1997 > 14(3): 173-176

ZHANG Tao, ZHANG Tong-he, ZHANG Hui-xing, MA Ben-kun, LI Guo-qing, GONG Ze-xiang. Applications of Multicomponent Ion Beam Enhanced Deposition in New Film Material[J]. Nuclear Physics Review, 1997, 14(3): 173-176. doi: 10.11804/NuclPhysRev.14.03.173

Citation:

ZHANG Tao, ZHANG Tong-he, ZHANG Hui-xing, MA Ben-kun, LI Guo-qing, GONG Ze-xiang. Applications of Multicomponent Ion Beam Enhanced Deposition in New Film Material[J]. Nuclear Physics Review, 1997, 14(3): 173-176. doi: 10.11804/NuclPhysRev.14.03.173

Applications of Multicomponent Ion Beam Enhanced Deposition in New Film Material

doi: 10.11804/NuclPhysRev.14.03.173

1 Institute of Low Energy Nuclear Physics; Beijing Normal University; Radiation Beam & Materials Engineering Laboratory of State Education Committee of China; Three Beam Laboratory,Dalian University of Technology

Received Date: 1900-01-01
Rev Recd Date: 1900-01-01
Publish Date: 1997-09-20

Abstract

Multicomponent ion beam enhanced deposition was used to synthesize (TiCr)N films. The films were characterized by AES,TEM and XRD methods. The electrochemical property and mechanics property of the films were measured. The experimental results show that the multicomponent ion beam enhanced deposition has stronger potential of new material development than physical vapour deposition.
- ion beam,
- film,
- （TiCr）N
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通讯作者: 陈斌, bchen63@163.com

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沈阳化工大学材料科学与工程学院沈阳 110142

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