Ion Implantation in GaAs
doi: 10.11804/NuclPhysRev.14.03.177
- Received Date: 1900-01-01
- Rev Recd Date: 1900-01-01
- Publish Date: 1997-09-20
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Key words:
- GaAs /
- ion implantation /
- rapid thermal annealing
Abstract: Optical and electrical properties of Si GaAs wafers implanted with Si+, S+, Be+, Mg+, B+, O+ have been investigated in this paper.
Citation: | LI Guo-hui, JI Cheng-zhou, LIU Yi-li, LUO Yan, HAN De-jun. Ion Implantation in GaAs[J]. Nuclear Physics Review, 1997, 14(3): 177-180. doi: 10.11804/NuclPhysRev.14.03.177 |