Study on Implanted Silicon with MeV Ions
doi: 10.11804/NuclPhysRev.14.03.181
- Received Date: 1900-01-01
- Rev Recd Date: 1900-01-01
- Publish Date: 1997-09-20
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Key words:
- high energy implantation /
- enhanced annealing /
- defect engineering
Abstract: This paper presents a briefing of the development of implanted silicon with MeV high energy ion at the BNU of late years. A lot of subjects are reviewed.
Citation: | LU Wu-xing, WU Yu-guang. Study on Implanted Silicon with MeV Ions[J]. Nuclear Physics Review, 1997, 14(3): 181-184. doi: 10.11804/NuclPhysRev.14.03.181 |